[譯者] 譯者RalfSCU 英、中翻譯

作者: RalfSCU (風中的落葉)   2020-07-05 21:32:19
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[必]擅長領域:理工
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[必]學  歷:(國立交通大學、應用化學系、博士)
[必]翻譯經歷:族繁不及備載
[選]工作經歷:(台灣光罩、鉅晶電子、華邦電子、光馳科技)
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[選]自我介紹:113 理學Ph. D.
原為單純的中科上班族
2016因為一台違規的貨車成了極重度殘障
接著遇到主管職場霸凌
被逼自願離職,失業至今
但是我還是得想辦法賺生活費和醫藥費
還請各位多幫忙,就算自己沒有需要,也幫我多介紹客戶,感恩。
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[選]其他說明:
參考文件:
歷年著作(Publications)
一、 論文(Papers)
1. W. A. Loong, C. M. Lin, S. P. Tseng, W. L. Yeh,
“The correlation between the chemical compositions
and optical properties of TiSixNy as an embedded
layer for AttPSM in 193 nm”,
Microelectronic Engineering 57-58 (2001) pp. 481.
2. W. A Leong, H. Y. Lin, W. L. Yeh,
“Study on the optimization of high transmittance
attenuated phase-shifting mask by design of experiment”,
2002 International Microprocesses and Nanotechnology Conference, 2002. Digest of Papers.
3. K. T. Yeh, C. H. Lin, J. R. Hu and W. A. Loong,
“Modified Reflectance–Transmittance Method for the
Metrology of Thin Film Optical Properties”,
Jpn. J. Appl. Phys. 45 (2006) pp. 1566.
4. K. T. Yeh and W. A. Loong,
“Simulations of Mask Error Enhancement Factor in
193nm Immersion Lithography”,
Jpn. J. Appl. Phys. 45 (2006) pp. 2481.
5. K. T. Yeh, and W. A. Loong,
“Simulation for Optimization of Mask Error Enhancement Factor
by Design of Experiments in Both Dry and Immersion ArF Lithography”,
Jpn. J. Appl. Phys. 45 (2006) pp. 6216.
6. K. T. Yeh, H. Y. Lin and W. A. Loong,
“Simulation of Applications of High-Transmittance Embedded Layer
in Transmittance Control Mask and Optimization of
Attenuated Phase-Shifting Mask by Design of Experiment”,
Jpn. J. Appl. Phys. 46 (2007) pp. 105.
7. J. S. Chen, K. T. Yeh, C. C. Wu and D. Y. Kao,
“IR Study of Monomer–Dimer Selfassociation of
2,2-Dimethyl-3-ethyl-3-pentanol in n-Octane:
Determination of the Molar Absorptivities of
Monomer and Dimer Bands, and Dimerization Constants
Using Novel Equations”,
J. Solution chem.. 42 (2013) pp. 2269.
8. J. S. Chen, K. T. Yeh, W. Y. Chang and J. K. Baird,
“Estimation of the Moments of the Residence Time and First
Passage Time from Experimentally Measurable Permeation Parameters
via a New Formulation of the Transmission Matrix”,
J. Chin. chem. Soc. 61 (2014) pp. 867.
9. K. T. Yeh and C. Y. Huang,
“Two new design methods for lithography mask:
phase-shifting scattering bar and interlaced phase-shifting mask”,
Proc. SPIE 9256 (2014) pp. 95260W-1
10. J. S. Chen, K. T. Yeh and W. Y. Chang,
“Green’s Function and Eigenvalue Representation of Time Lag
for Absorptive Permeation Across a Heterogeneous Membrane”,
J. Chin. chem. Soc. 64 (2017) pp. 1048.
11. J. S. Chen, K. T. Yeh, D. Y. Kao and J. K. Baird,
“Toward a Better Determination of Infrared Molar Absorptivities
and Dimer Formation Constants in Self-association
Through Hydrogen Bonding:
3-Ethyl-2-methyl-3-pentanol in Tetrachloroethylene as an Example”,
J. Chin. chem. Soc. 64 (2017) pp. 1156.
12. J. S. Chen, K. T. Yeh and W. Y. Chang,
“Insights into the Kramers’ flux-over-population rate
for chemical reactions in liquid phases through
the matrix transport equation”,
J. Chin. chem. Soc. 66 (2019) pp. 899.
二、 專利(Patents)
1. K. T. Yeh, “Optical proximity correction photomask”, US Patent 8524424 (2013)
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作者: dskdlkj   2020-07-06 00:13:00
幫你加油
作者: kimberleyt (棉花糖巧克力)   2020-07-09 04:46:00
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